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Polymer Waveguide Material Etched With a KrF Excimer Laser

170 um diameter features and waveguides etched in polymer waveguide material on a silicon substrate etched with Helium assist gas.
(Photos courtesy of Lambda Physik USA, Inc.)

170 µm diameter features and waveguides etched in polymer waveguide material on a silicon substrate etched with Clean Lase and no post processing.  The lines of the waveguide are resolved to less than 2 µm and the imaging lens had a specified resolution of 3.5 µm.
(Photos courtesy of Lambda Physik USA, Inc.)

200 µm Wide Grooves Etched by a KrF Excimer Laser

100X and 200X micrographs of PET laser machined in air.
(Photos Courtesy of Exitech, Inc.)

100X and 200X micrographs of PET laser machined with Clean Lase.
(Photos Courtesy of Exitech, Inc.)

60 µm Wide Grooves Etched by a KrF Excimer Laser

100X and 200X micrographs of PET laser machined in air.
(Photos Courtesy of Exitech, Inc.)

100X and 200X micrographs of PET laser machined with Clean Lase.
(Photos Courtesy of Exitech, Inc.)

 

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Last modified: 07/31/08